Maximum Sample Size: 12×12 cm2
Maximum Sample Height: few cm
6 crucibles in the reactor
Different masks available
No use of Zn and Sn due to contamination risks
Au, Pt, Cr, Ni, Al, Ag, Cu, Ti, Ge
Manufacturer: Plassys
Model: MEB 550SL
Minimum training time to use the machine: 1 days
Deposition of metal by e-beam evaporation:
Metallic contacts, grids
Specifications: deposition at ambient temperature
Excellent purity of the film because of the high vacuum condition
Limitation: direct deposition (difficulties to deposit homogeneous film on rough substrate)
The substrate is placed inside the chamber, where a source metal to be deposited is located. The source material is heated to the point where it starts to boil and evaporate. This process requires a high vacuum (10-6 to 10-7 Torr) to allow the molecules to evaporate freely in the chamber, and they subsequently condense on all surfaces.
High film deposition rates
Process deposition duration: depends of the thickness (controlled by QCM)
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